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    ASPDAC
    2007
    ACM
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    A New Methodology for Interconnect Parasitics Extraction Considering Photo-Lithography Effects
    13 years 8 months ago
    A New Methodology for Interconnect Parasitics Extraction Considering Photo-Lithography Effects
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    Abstract-- Due to photo-lithography effects and manufacture process variations, the actual features fabricated on the wafer are different from the designed ones. This difference ca...
    Ying Zhou, Zhuo Li, Yuxin Tian, Weiping Shi, Frank...
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