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ICCAD
2007
IEEE
111views Hardware» more  ICCAD 2007»
14 years 1 months ago
Exploiting STI stress for performance
— Starting at the 65nm node, stress engineering to improve performance of transistors has been a major industry focus. An intrinsic stress source – shallow trench isolation –...
Andrew B. Kahng, Puneet Sharma, Rasit Onur Topalog...