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    GLVLSI
    2006
    IEEE
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    Measurement and characterization of pattern dependent process variations of interconnect resistance, capacitance and inductance
    13 years 11 months ago
    Measurement and characterization of pattern dependent process variations of interconnect resistance, capacitance and inductance
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    Process variations have become a serious concern for nanometer technologies. The interconnect and device variations include interand intra-die variations of geometries, as well as...
    Xiaoning Qi, Alex Gyure, Yansheng Luo, Sam C. Lo, ...
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