Abstract—Antenna problem is a phenomenon of plasma-induced gateoxide degradation. It directly affects manufacturability of very large scale integration (VLSI) circuits, especiall...
Li-Da Huang, Xiaoping Tang, Hua Xiang, D. F. Wong,...
As technology enters the nanometer territory, the antenna effect plays an important role in determining the yield and reliability of a VLSI circuit. Diode insertion and jumper in...
Antenna effect may damage gate oxides during plasma-based fabrication process. The antenna ratio of total exposed antenna area to total gate oxide area is directly related to the ...
As the process technology enters the nanometer era, reliability has become a major concern in the design and manufacturing of VLSI circuits. In this paper we focus on one reliabil...
As VLSI technology enters the nanoscale regime, interconnect delay has become the bottleneck of the circuit timing. As one of the most powerful techniques for interconnect optimiz...