3 search results - page 1 / 1 » A novel intensity based optical proximity correction algorit... |
ICCAD
2007
IEEE
14 years 1 months ago
2007
IEEE
Abstract—It is important to reduce the Optical Proximity Correction (OPC) runtime while maintaining a good result quality. In this paper, we obtain a better formula, which theore...
DAC
2003
ACM
14 years 5 months ago
2003
ACM
As minimum feature sizes continue to shrink, patterned features have become significantly smaller than the wavelength of light used in optical lithography. As a result, the requir...
DAC
2008
ACM
14 years 5 months ago
2008
ACM
In this paper, we present ELIAD, an efficient lithography aware detailed router to optimize silicon image after optical proximity correction (OPC) in a correct-by-construction man...