The wire sizing problem under inequality Elmore delay constraints is known to be posynomial, hence convex under an exponential variable-transformation. There are formal methods fo...
— Starting at the 65nm node, stress engineering to improve performance of transistors has been a major industry focus. An intrinsic stress source – shallow trench isolation –...
Andrew B. Kahng, Puneet Sharma, Rasit Onur Topalog...
As VLSI technology enters the nanoscale regime, interconnect delay has become the bottleneck of the circuit timing. As one of the most powerful techniques for interconnect optimiz...
As VLSI technology moves to the 65nm node and beyond, interconnect delay greatly limits the circuit performance. As a critical component in interconnect synthesis, layer assignmen...
Image computation nds wide application in VLSI CAD, such as state reachability analysis in formal veri cation and synthesis, combinational veri cation, combinational and sequential...