17 search results - page 2 / 4 » Alternative formulations for a layout problem in the fashion... |
DAC
2003
ACM
14 years 6 months ago
2003
ACM
Chemical-mechanical planarization (CMP) and other manufacturing steps in very deep-submicron VLSI have varying effects on device and interconnect features, depending on the local ...
DAC
2000
ACM
13 years 9 months ago
2000
ACM
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
ICRA
2010
IEEE
13 years 4 months ago
2010
IEEE
Abstract— In this paper, we address the problem of determining the relative position and orientation (pose) of two robots navigating in 2D, based on known egomotion and noisy rob...
WICON
2008
13 years 6 months ago
2008
We consider a pair of nodes with stochastic traffic flows who wish to communicate in a bi-directional communication scenario using intermediate relays in two-hop fashion. Intermed...
ICCV
2003
IEEE
14 years 7 months ago
2003
IEEE
This paper presents an algorithm for computing optical flow, shape, motion, lighting, and albedo from an image sequence of a rigidly-moving Lambertian object under distant illumin...