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ICCAD
2009
IEEE
13 years 3 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
ICDM
2009
IEEE
13 years 3 months ago
2009
IEEE
Being able to incorporate, inspect, and analyze data with newly developed technologies, diagnostics, and visualizations in an easy and flexible way has been a longstanding challen...
IEEEPACT
2009
IEEE
13 years 3 months ago
2009
IEEE
Resource sharing can cause unfair and unpredictable performance of concurrently executing applications in Chip-Multiprocessors (CMP). The shared last-level cache is one of the mos...
COMGEO
2010
ACM
13 years 3 months ago
2010
ACM
The vision of an integrated Earth observation system to help protect and sustain the planet and its inhabitants is significant and timely, and thus has been identified recently by...
BCB
2010
13 years 23 days ago
2010
Growing sequencing and assembly efforts have been met by the advances in high throughput machines. However, the presence of massive amounts of repeats and transposons complicates ...