Antenna effect may damage gate oxides during plasma-based fabrication process. The antenna ratio of total exposed antenna area to total gate oxide area is directly related to the ...
As the process technology enters the nanometer era, reliability has become a major concern in the design and manufacturing of VLSI circuits. In this paper we focus on one reliabil...
As technology advances into nanometer territory, the antenna problem has caused significant impact on routing tools. The antenna effect is a phenomenon of plasmainduced gate oxide...
The sustained progress of VLSI technology has altered the landscape of routing which is a major physical design stage. For timing driven routings, traditional approaches which con...