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» Characterizing cloud computing hardware reliability
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DAC
2006
ACM
14 years 5 months ago
Process variation aware OPC with variational lithography modeling
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
Peng Yu, Sean X. Shi, David Z. Pan
COOPIS
2002
IEEE
13 years 9 months ago
Composing and Deploying Grid Middleware Web Services Using Model Driven Architecture
Rapid advances in networking, hardware, and middleware technologies are facilitating the development and deployment of complex grid applications, such as large-scale distributed co...
Aniruddha S. Gokhale, Balachandran Natarajan
DAC
2005
ACM
14 years 5 months ago
Advanced Timing Analysis Based on Post-OPC Extraction of Critical Dimensions
While performance specifications are verified before sign-off for a modern nanometer scale design, extensive application of optical proximity correction substantially alters the l...
Puneet Gupta, Andrew B. Kahng, Youngmin Kim, Denni...
ADHOC
2011
12 years 8 months ago
RadiaLE: A framework for designing and assessing link quality estimators in wireless sensor networks
—Stringent cost and energy constraints impose the use of low-cost and low-power radio transceivers in large-scale wireless sensor networks (WSNs). This fact, together with the ha...
Nouha Baccour, Anis Koubaa, Maissa Ben Jamâa...