As we move from deep submicron technology to nanotechnology for device manufacture, the need for defect-tolerant architectures is gaining importance. This is because, at the nanos...
Gethin Norman, David Parker, Marta Z. Kwiatkowska,...
Shrinking devices to the nanoscale, increasing integration densities, and reducing of voltage levels down to the thermal limit, all conspire to produce faulty systems. Frequent oc...
Kundan Nepal, R. Iris Bahar, Joseph L. Mundy, Will...
Abstract--The fabrication of crossbar memories with sublithographic features is expected to be feasible within several emerging technologies; in all of them, the nanowire (NW) deco...
M. Haykel Ben Jamaa, Kirsten E. Moselund, David At...
As Si CMOS devices are scaled down into the nanoscale regime, current computer architecture approaches are reaching their practical limits. Future nano-architectures will confront...
Kundan Nepal, R. Iris Bahar, Joseph L. Mundy, Will...
Device and interconnect fabrics at the nanoscale will have a density of defects and susceptibility to transient faults far exceeding those of current silicon technologies. In this...
Andrey V. Zykov, Elias Mizan, Margarida F. Jacome,...