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DAC
2009
ACM
14 years 6 months ago
2009
ACM
In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
ICCAD
2008
IEEE
14 years 1 months ago
2008
IEEE
— Double patterning technology (DPT) is a most likely lithography solution for 32/22nm technology nodes as of 2008 due to the delay of Extreme Ultra Violet lithography. However, ...