76 search results - page 2 / 16 » Doubled Patterns are 3-Avoidable |
ICDAR
2009
IEEE
13 years 3 months ago
2009
IEEE
A novel method for the segmentation of double-sided ancient document images suffering from bleed-through effect is presented. It takes advantage of the level set framework to prov...
ICDAR
2009
IEEE
2009
IEEE
Registration and Enhancement of Double-Sided Degraded Manuscripts Acquired in Multispectral Modality
13 years 3 months ago
We propose a system to process multispectral scans of double-sided documents. It can co-register any number of recto and verso channel maps, and reduce the bleed-through/show-thro...
PR
2000
13 years 5 months ago
2000
: Identifying PSL(2, C) as a projective group for patterns in the conformal camera model, the projective harmonic analysis on its double covering group SL(2, C) is presented in the...
SLIP
2009
ACM
14 years 8 days ago
2009
ACM
Double patterning lithography seems to be a prominent choice for 32nm and 22nm technologies. Double patterning lithography techniques require additional masks for a single interco...
ISQED
2010
IEEE
14 years 19 days ago
2010
IEEE
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...