3 search results - page 1 / 1 » Dummy fill optimization for enhanced manufacturability |
ISPD
2010
ACM
13 years 11 months ago
2010
ACM
ASPDAC
2007
ACM
13 years 8 months ago
2007
ACM
As integrated circuits manufacturing technology is advancing into 65nm and 45nm nodes, extensive resolution enhancement techniques (RETs) are needed to correctly manufacture a chip...
DAC
2008
ACM
14 years 5 months ago
2008
ACM
In this paper, we present ELIAD, an efficient lithography aware detailed router to optimize silicon image after optical proximity correction (OPC) in a correct-by-construction man...