Abstract-- In nanometer-scale VLSI technologies, several interconnect issues like routing congestion and interconnect delay have become the main concerns in placement. However, all...
- This paper reports on a highly effective methodology to construct complex high performance microprocessors. Critical aspects of the methodology include an integrated database for...
A. Bertolet, K. Carpenter, Keith M. Carrig, Albert...
Due to skewed scaling of interconnect delay and cell delay with technology scaling, modern VLSI timing closure requires use of extensive buffer insertion. Inserting a large number...
Tung-Chieh Chen, Ashutosh Chakraborty, David Z. Pa...
As VLSI technology moves to the 65nm node and beyond, interconnect delay greatly limits the circuit performance. As a critical component in interconnect synthesis, layer assignmen...
In this paper, we show that under the constant delay model the placement problem is equivalent to minimizing a weighted sum of wire lengths. The weights can be efficiently compute...
Kolja Sulimma, Wolfgang Kunz, Ingmar Neumann, Luka...