13 search results - page 1 / 3 » Emerging Yield and Reliability Challenges in Nanometer CMOS ... |
DATE
2008
IEEE
13 years 11 months ago
2008
IEEE
ASPDAC
2007
ACM
13 years 8 months ago
2007
ACM
As IC process geometries scale down to the nanometer territory, the industry faces severe challenges of manufacturing limitations. To guarantee yield and reliability, physical des...
ICCAD
2006
IEEE
14 years 1 months ago
2006
IEEE
The use of CMOS nanometer technologies at 65 nm and below will pose serious challenges on the design of mixed-signal integrated systems in the very near future. Rising design comp...
DAC
2006
ACM
14 years 5 months ago
2006
ACM
Increasing resistivity of copper with scaling and rising demands on current density requirements are driving the need to identify new wiring solutions for deep nanometer scale VLS...
DAC
2009
ACM
14 years 5 months ago
2009
ACM
Silicon nanowires are a promising solution to address the increasing challenges of fabrication and design at the future nodes of the Complementary Metal-Oxide-Semiconductor (CMOS)...