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    ISPD
    2010
    ACM
    249views Hardware» more  ISPD 2010»
    A matching based decomposer for double patterning lithography
    14 years 5 days ago
    A matching based decomposer for double patterning lithography
    Download  home.eng.iastate.edu
    Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
    Yue Xu, Chris Chu
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