12 search results - page 2 / 3 » Minimal Solutions for Panoramic Stitching |
ICCAD
2008
IEEE
14 years 2 months ago
2008
IEEE
— Double patterning technology (DPT) is a most likely lithography solution for 32/22nm technology nodes as of 2008 due to the delay of Extreme Ultra Violet lithography. However, ...
ECCV
2006
Springer
14 years 7 months ago
2006
Springer
One of the most exciting advances in early vision has been the development of efficient energy minimization algorithms. Many early vision tasks require labeling each pixel with som...
PAMI
2008
13 years 5 months ago
2008
Among the most exciting advances in early vision has been the development of efficient energy minimization algorithms for pixel-labeling tasks such as depth or texture computation....
ICRA
2009
IEEE
14 years 1 days ago
2009
IEEE
— We consider the problem of tracking multiple agents moving amongst obstacles, using multiple cameras. Given an environment with obstacles, and many people moving through it, we...
DAC
2009
ACM
14 years 6 months ago
2009
ACM
In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...