12 search results - page 3 / 3 » Minimal Solutions for Panoramic Stitching |
ISPD
2010
ACM
14 years 7 days ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
CVPR
2012
IEEE
11 years 7 months ago
2012
IEEE
A large number of problems in computer vision can be modeled as energy minimization problems in a markov random field (MRF) framework. Many methods have been developed over the y...