12 search results - page 2 / 3 » New and Exact Filling Algorithms for Layout Density Control |
ISPD
2010
ACM
14 years 5 days ago
2010
ACM
In the nanometer IC design, dummy fill is often performed to improve layout pattern uniformity and the post-CMP quality. However, filling dummies might greatly increase intercon...
ISPD
1998
ACM
13 years 9 months ago
1998
ACM
In very deep-submicron VLSI, certain manufacturing steps – notably optical exposure, resist development and etch, chemical vapor deposition and chemical-mechanical polishing (CM...
DAC
2009
ACM
14 years 6 months ago
2009
ACM
Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
DATE
2003
IEEE
13 years 10 months ago
2003
IEEE
Control of variability and performance in the back end of the VLSI manufacturing line has become extremely difficult with the introduction of new materials such as copper and low...
CGF
2005
13 years 5 months ago
2005
The point set is a flexible surface representation suitable for both geometry processing and real-time rendering. In most applications, the control of the point cloud density is c...