11 search results - page 1 / 3 » Pattern sensitive placement for manufacturability |
ISPD
2007
ACM
13 years 6 months ago
2007
ACM
When VLSI technology scales toward 45nm, the lithography wavelength stays at 193nm. This large gap results in strong refractive effects in lithography. Consequently, it is a huge...
TVLSI
2010
12 years 11 months ago
2010
The gap between VLSI technology and fabrication technology leads to strong refractive effects in lithography. Consequently, it is a huge challenge to reliably print layout features...
DAC
2000
ACM
13 years 9 months ago
2000
ACM
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
ICCAD
2009
IEEE
13 years 2 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
AEI
2007
13 years 5 months ago
2007
Data mining mechanisms have widely been applied in various businesses and manufacturing companies across many industry sectors. Sharing data or sharing mined rules has become a tr...