157 search results - page 1 / 32 » Process Variation Aware Issue Queue Design |
DATE
2008
IEEE
13 years 11 months ago
2008
IEEE
In sub-90nm process technology it becomes harder to control the fabrication process, which in turn causes variations between the design-time parameters and the fabricated paramete...
DSN
2008
IEEE
13 years 11 months ago
2008
IEEE
The last few years have witnessed an unprecedented explosion in transistor densities. Diminutive feature sizes have enabled microprocessor designers to break the billion-transisto...
ASPDAC
2004
ACM
13 years 8 months ago
2004
ACM
- Globally-Asynchronous, Locally-Synchronous (GALS) design style has started to gain interest recently as a possible solution to the increased design complexity, power and thermal ...
DAC
2006
ACM
14 years 5 months ago
2006
ACM
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
ISLPED
2005
ACM
13 years 10 months ago
2005
ACM
The instruction scheduling logic used in modern superscalar microprocessors often relies on associative searching of the issue queue entries to dynamically wakeup instructions for...