In sub-90nm process technology it becomes harder to control the fabrication process, which in turn causes variations between the design-time parameters and the fabricated paramete...
The last few years have witnessed an unprecedented explosion in transistor densities. Diminutive feature sizes have enabled microprocessor designers to break the billion-transisto...
- Globally-Asynchronous, Locally-Synchronous (GALS) design style has started to gain interest recently as a possible solution to the increased design complexity, power and thermal ...
Venkata Syam P. Rapaka, Emil Talpes, Diana Marcule...
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
The instruction scheduling logic used in modern superscalar microprocessors often relies on associative searching of the issue queue entries to dynamically wakeup instructions for...
Joseph J. Sharkey, Dmitry V. Ponomarev, Kanad Ghos...