23 search results - page 2 / 5 » Reliability challenges for 45nm and beyond |
TC
2011
12 years 11 months ago
2011
—Aggressive technology scaling to 45nm and below introduces serious reliability challenges to the design of microprocessors. Since a large fraction of chip area is devoted to on-...
DSN
2009
IEEE
13 years 11 months ago
2009
IEEE
The threat of soft error induced system failure in high performance computing systems has become more prominent, as we adopt ultra-deep submicron process technologies. In this pap...
ISPD
2007
ACM
13 years 6 months ago
2007
ACM
When VLSI technology scales toward 45nm, the lithography wavelength stays at 193nm. This large gap results in strong refractive effects in lithography. Consequently, it is a huge...
QSHINE
2009
IEEE
13 years 11 months ago
2009
IEEE
In 2003, we presented an architecture for a streaming video quality assessment system [1]. Six years later, many of the challenges outlined in that paper remain. This paper revisit...
IJMMS
2006
13 years 4 months ago
2006
How to measure usability is an important question in HCI research and user interface evaluation. We review current practice in measuring usability by categorizing and discussing u...