264 search results - page 3 / 53 » Two Paradigms Are Better Than One, and Multiple Paradigms Ar... |
ICCAD
2007
IEEE
14 years 2 months ago
2007
IEEE
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
ICPPW
2009
IEEE
14 years 11 days ago
2009
IEEE
A significant fraction of parallel scientific codes are iterative with barriers between iterations or even between phases of the same iteration. The sender of a message is assur...
AAI
2005
13 years 5 months ago
2005
This paper discusses Betty's Brain, a teachable agent in the domain of river ecosystems that combines learning by teaching with self-regulation mentoring to promote deep lear...
TVLSI
2008
13 years 5 months ago
2008
We present a Mutation-based Validation Paradigm (MVP) technology that can handle complete high-level microprocessor implementations and is based on explicit design error modeling, ...
ICDE
2010
IEEE
13 years 6 months ago
2010
IEEE
— As person names are non-unique, the same name on different Web pages might or might not refer to the same real-world person. This entity identification problem is one of the m...