19 search results - page 2 / 4 » Variation Aware Placement for FPGAs |
FPGA
2010
ACM
14 years 2 months ago
2010
ACM
Deep submicron processes have allowed FPGAs to grow in complexity and speed. However, such technology scaling has caused FPGAs to become more susceptible to the effects of process...
ISQED
2007
IEEE
13 years 11 months ago
2007
IEEE
In nanometer regime, the effects of variations are having an increasing impact on the delay and power characteristics of devices as well as the yield of the circuit. Statistical t...
DATE
2006
IEEE
13 years 11 months ago
2006
IEEE
Process variations due to lens aberrations are to a large extent systematic, and can be modeled for purposes of analyses and optimizations in the design phase. Traditionally, vari...
FPGA
2007
ACM
13 years 11 months ago
2007
ACM
Chip design in the nanometer regime is becoming increasingly difficult due to process variations. ASIC designers have adopted statistical optimization techniques to mitigate the e...
DAC
2006
ACM
14 years 6 months ago
2006
ACM
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...