—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
This paper examines the problem of statically analyzing the performance of embedded software. This problem is motivated by the increasing growth of embedded systems and a lack of ...
Sharad Malik, Margaret Martonosi, Yau-Tsun Steven ...
The biggest obstacle in the formal verification of large designs is their very large state spaces, which cannot be handled even by techniques such as implicit state space travers...
A number of industry trends are shaping the requirements for IC and electronic equipment design. The density and complexity of circuit technologies have increased to a point where...
: Academic clock routing research results has often had limited impact on industry practice, since such practical considerations as hierarchical buffering, rise-time and overshoot ...