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ISQED
2010
IEEE
13 years 3 months ago
2010
IEEE
Reduced device dimensions and operating voltages that accompany technology scaling have led to increased design challenges with each successive technology node. Large scale 6T SRA...
ISQED
2010
IEEE
13 years 3 months ago
2010
IEEE
Low power, minimum transistor count and fast access static random access memory (SRAM) is essential for embedded multimedia and communication applications realized using system on...
ISQED
2010
IEEE
13 years 11 months ago
2010
IEEE
— Timing exceptions in IC implementation processes, especially timing verification, help reduce pessimism that arises from unnecessary timing constraints by masking non-function...
ISQED
2010
IEEE
13 years 11 months ago
2010
IEEE
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...