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    ASPDAC
    2001
    ACM
    102views Hardware» more  ASPDAC 2001»
    New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout
    13 years 8 months ago
    New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout
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    Abstract-- We describe new graph bipartization algorithms for layout modification and phase assignment of bright-field alternating phaseshifting masks (AltPSM) [25]. The problem of...
    Andrew B. Kahng, Shailesh Vaya, Alexander Zelikovs...
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