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ISVLSI
2007
IEEE
161views VLSI» more  ISVLSI 2007»
10 years 10 months ago
CMP-aware Maze Routing Algorithm for Yield Enhancement
— Chemical-Mechanical Polishing (CMP) is one of the key steps during nanometer VLSI manufacturing process where minimum variation of layout pattern densities is desired. This pap...
Hailong Yao, Yici Cai, Xianlong Hong
books