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9

VLSID
2005
IEEE

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Electromigration-Aware Physical Design of Integrated Circuits

14 years 5 months ago

Electromigration-Aware Physical Design of Integrated Circuits

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The electromigration effect within current-density-stressed signal and power lines is an ubiquitous and increasingly important reliability and design problem in sub-micron IC designs. It is therefore necessary to consider electromigration-related design parameters as early as possible in the physical design flow. In this

Göran Jerke, Jens Lienig

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Computer Architecture | Electromigration-related Design Parameters | Physical Design Flow | Sub-micron Ic Designs | VLSID 2005 |

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Added	01 Dec 2009
Updated	01 Dec 2009
Type	Conference
Year	2005
Where	VLSID
Authors	Göran Jerke, Jens Lienig

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