2 search results - page 1 / 1 » A parameterized mask model for lithography simulation |
DAC
2009
ACM
13 years 10 months ago
2009
ACM
DATE
2009
IEEE
14 years 1 days ago
2009
IEEE
— Lithographic variability and its impact on printability is a major concern in today’s semiconductor manufacturing process. To address sub-wavelength printability, a number of...