Hierarchical approach greatly facilitates large-scale chip design by hiding distracting details in low-level objects. However, the lowlevel designs have to have a global view of h...
As VLSI technology enters the nanoscale regime, interconnect delay has become the bottleneck of the circuit timing. As one of the most powerful techniques for interconnect optimiz...
As VLSI technology moves to the 65nm node and beyond, interconnect delay greatly limits the circuit performance. As a critical component in interconnect synthesis, layer assignmen...
In this paper, we present ELIAD, an efficient lithography aware detailed router to optimize silicon image after optical proximity correction (OPC) in a correct-by-construction man...
With continued scaling into the sub-90nm regime, the role of process, voltage and temperature (PVT) variations on the performance of VLSI circuits has become extremely important. T...
Sanjay V. Kumar, Chris H. Kim, Sachin S. Sapatneka...