Recent successes in the development and self-assembly of nanoelectronic devices suggest that the ability to manufacture dense nanofabrics is on the near horizon. However, the trem...
Margarida F. Jacome, Chen He, Gustavo de Veciana, ...
With advances in process technology, the feature sizes are decreasing, which leads to higher defect densities. More sophisticated techniques, at increased costs are required to av...
As we move from deep submicron technology to nanotechnology for device manufacture, the need for defect-tolerant architectures is gaining importance. This is because, at the nanos...
Gethin Norman, David Parker, Marta Z. Kwiatkowska,...
Device and interconnect fabrics at the nanoscale will have a density of defects and susceptibility to transient faults far exceeding those of current silicon technologies. In this...
Andrey V. Zykov, Elias Mizan, Margarida F. Jacome,...
As Si CMOS devices are scaled down into the nanoscale regime, current computer architecture approaches are reaching their practical limits. Future nano-architectures will confront...
Kundan Nepal, R. Iris Bahar, Joseph L. Mundy, Will...