17 search results - page 1 / 4 » Design and CAD challenges in 45nm CMOS and beyond |
ICCAD
2006
IEEE
14 years 1 months ago
2006
IEEE
With semiconductor industry's aggressive march towards 45nm
DAC
2006
ACM
14 years 5 months ago
2006
ACM
DATE
2008
IEEE
13 years 11 months ago
2008
IEEE
The prospective use of upcoming nanometer CMOS technology nodes (65nm, 45nm, and beyond) in bioelectronic interfaces is raising a number of important issues concerning circuit arc...
ISPD
2010
ACM
13 years 11 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
ICCAD
2002
IEEE
14 years 1 months ago
2002
IEEE
Future high performance microprocessor design with technology scaling beyond 90nm will pose two major challenges: (1) energy and power, and (2) parameter variations. Design practi...