16 search results - page 1 / 4 » Double patterning technology friendly detailed routing |
ICCAD
2008
IEEE
14 years 1 months ago
2008
IEEE
— Double patterning technology (DPT) is a most likely lithography solution for 32/22nm technology nodes as of 2008 due to the delay of Extreme Ultra Violet lithography. However, ...
DAC
2009
ACM
14 years 5 months ago
2009
ACM
In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
ICCAD
2009
IEEE
13 years 2 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
TCAD
2008
13 years 4 months ago
2008
As the technology node advances into the nanometer era, via-open defects are one of the dominant failures due to the copper cladding process. To improve via yield and reliability, ...
IMC
2009
ACM
13 years 11 months ago
2009
ACM
Understanding how users behave when they connect to social networking sites creates opportunities for better interface design, richer studies of social interactions, and improved ...