20 search results - page 1 / 4 » Impact of Modern Process Technologies on the Electrical Para... |
VLSID
2007
IEEE
14 years 5 months ago
2007
IEEE
Abstract-- This paper presents the results obtained from an experimental study of the impact of modern process technologies on the electrical parameters of interconnects. Variation...
GLVLSI
2006
IEEE
13 years 11 months ago
2006
IEEE
Process variations have become a serious concern for nanometer technologies. The interconnect and device variations include interand intra-die variations of geometries, as well as...
CISIS
2009
IEEE
2009
IEEE
Designing Regular Network-on-Chip Topologies under Technology, Architecture and Software Constraints
13 years 11 months ago
—Regular multi-core processors are appearing in the embedded system market as high performance software programmable solutions. The use of regular interconnect fabrics for them a...
DFT
1998
IEEE
13 years 9 months ago
1998
IEEE
The statistical variations in electrical parameters, such as transistor gain factors and interconnect resistances, due to variations in the manufacturing process are studied using...
GLVLSI
2006
IEEE
13 years 11 months ago
2006
IEEE
Process technology and environment-induced variability of gates and wires in VLSI circuits make timing analyses of such circuits a challenging task. Process variation can have a s...