4 search results - page 1 / 1 » Layout impact of resolution enhancement techniques: impedime... |
ISPD
2003
ACM
13 years 10 months ago
2003
ACM
DATE
2009
IEEE
13 years 11 months ago
2009
IEEE
— Lithographic variability and its impact on printability is a major concern in today’s semiconductor manufacturing process. To address sub-wavelength printability, a number of...
DAC
2004
ACM
14 years 5 months ago
2004
ACM
Resolution enhancement techniques (RET) such as optical proximity correction (OPC) and phase-shift mask (PSM) technology are deployed in modern processes to increase the fidelity ...
ICCAD
2009
IEEE
13 years 2 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...