55 search results - page 1 / 11 » Lithography Driven Layout Design |
VLSID
2005
IEEE
13 years 10 months ago
2005
IEEE
ICCAD
2008
IEEE
14 years 1 months ago
2008
IEEE
— Double patterning technology (DPT) is a most likely lithography solution for 32/22nm technology nodes as of 2008 due to the delay of Extreme Ultra Violet lithography. However, ...
ISPD
1999
ACM
13 years 9 months ago
1999
ACM
We review the implications of subwavelength optical lithography for new tools and ows in the interface between layout design and manufacturability. After discussing the necessity ...
ICIP
2008
IEEE
14 years 6 months ago
2008
IEEE
The continual shrinkage of minimum feature size in integrated circuit (IC) fabrication incurs more and more serious distortion in the optical lithography process, generating circu...
TVLSI
2010
12 years 11 months ago
2010
The gap between VLSI technology and fabrication technology leads to strong refractive effects in lithography. Consequently, it is a huge challenge to reliably print layout features...