Subwavelength optical lithography: challenges and impact on physical design

We review the implications of subwavelength optical lithography for new tools and ows in the interface between layout design and manufacturability. After discussing the necessity of corrections for optical process e ects i.e., use of optical proximity correction OPC and phase-shifting masks PSM, we focus on the implications of OPC and PSM for layout and veri cation methodologies. Our discussion addresses the necessary changes in the design-tomanufacturing ow, including infrastructure development in the mask and process communities as well as opportunities for research and development in physical layout and veri cation.

• Type: Conference
• Year: 1999
• Where: ISPD
• Authors: Andrew B. Kahng, Y. C. Pati
• Keywords: Hardware, ISPD 1999, Subwavelength Optical Lithography, Veri Cation, Veri Cation Methodologies