55 search results - page 2 / 11 » Lithography Driven Layout Design |
ICCAD
2008
IEEE
14 years 2 months ago
2008
IEEE
In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different exposures)...
DAC
1999
ACM
14 years 7 months ago
1999
ACM
This tutorial paper surveys the potential implications of subwavelength optical lithography for new tools and flows in the interface between layout design and manufacturability. W...
TCAD
2010
13 years 22 days ago
2010
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
ASPDAC
2009
ACM
14 years 16 days ago
2009
ACM
Abstract— Double patterning lithography (DPL) is in current production for memory products, and is widely viewed as inevitable for logic products at the 32nm node. DPL decomposes...
ISPD
2007
ACM
13 years 7 months ago
2007
ACM
When VLSI technology scales toward 45nm, the lithography wavelength stays at 193nm. This large gap results in strong refractive effects in lithography. Consequently, it is a huge...