12 search results - page 1 / 3 » Monte-Carlo algorithms for layout density control |
ASPDAC
2000
ACM
13 years 9 months ago
2000
ACM
DAC
2000
ACM
14 years 5 months ago
2000
ACM
We propose practical iterated methods for layout density control for CMP uniformity, based on linear programming, Monte-Carlo and greedy algorithms. We experimentally study the tr...
TCAD
2002
13 years 4 months ago
2002
Chemical-mechanical polishing (CMP) and other manufacturing steps in very deep submicron VLSI have varying effects on device and interconnect features, depending on local character...
PG
2007
IEEE
2007
IEEE
Statistical Hypothesis Testing for Assessing Monte Carlo Estimators: Applications to Image Synthesis
13 years 11 months ago
Image synthesis algorithms are commonly compared on the basis of running times and/or perceived quality of the generated images. In the case of Monte Carlo techniques, assessment ...
VLSID
1999
IEEE
13 years 9 months ago
1999
IEEE
To reduce manufacturing variation due to chemicalmechanical polishing and to improve yield, layout must be made uniform with respect to density criteria. This is achieved by layou...