12 search results - page 2 / 3 » Monte-Carlo algorithms for layout density control |
ASPDAC
1999
ACM
13 years 10 months ago
1999
ACM
Certain manufacturing steps in very deep submicron VLSI involve chemical-mechanical polishing CMP which has varying e ects on device and interconnect features, depending on loca...
TCAD
2002
13 years 5 months ago
2002
DAC
2009
ACM
14 years 7 months ago
2009
ACM
Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
TOG
2002
13 years 5 months ago
2002
Treemaps, a space-filling method of visualizing large hierarchical data sets, are receiving increasing attention. Several algorithms have been proposed to create more useful displ...
ISPD
2010
ACM
14 years 24 days ago
2010
ACM
In the nanometer IC design, dummy fill is often performed to improve layout pattern uniformity and the post-CMP quality. However, filling dummies might greatly increase intercon...