33 search results - page 3 / 7 » Process variation aware OPC with variational lithography mod... |
DATE
2009
IEEE
13 years 11 months ago
2009
IEEE
— Lithographic variability and its impact on printability is a major concern in today’s semiconductor manufacturing process. To address sub-wavelength printability, a number of...
ISVLSI
2008
IEEE
13 years 11 months ago
2008
IEEE
In nanometer regime, the effects of process variations are dominating circuit performance, power and reliability of circuits. Hence, it is important to properly manage variation e...
ISPD
2010
ACM
13 years 12 months ago
2010
ACM
Standard cells are fundamental circuit building blocks designed at very early design stages. Nanometer standard cells are prone to lithography proximity and process variations. Ho...
ISQED
2007
IEEE
13 years 11 months ago
2007
IEEE
In nanometer regime, the effects of variations are having an increasing impact on the delay and power characteristics of devices as well as the yield of the circuit. Statistical t...
ISQED
2007
IEEE
13 years 11 months ago
2007
IEEE
This paper studies the impact of variability on the noise robustness of logic gates using noise rejection curves (NRCs). NRCs allow noise pulses to be modeled using magnitude-dura...