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ICDAR
2009
IEEE
13 years 3 months ago
Registration and Enhancement of Double-Sided Degraded Manuscripts Acquired in Multispectral Modality
We propose a system to process multispectral scans of double-sided documents. It can co-register any number of recto and verso channel maps, and reduce the bleed-through/show-thro...
Anna Tonazzini, Gianfranco Bianco, Emanuele Salern...
ICCAD
2009
IEEE
151views Hardware» more  ICCAD 2009»
13 years 3 months ago
GREMA: Graph reduction based efficient mask assignment for double patterning technology
Double patterning technology (DPT) has emerged as the most hopeful candidate for the next technology node of the ITRS roadmap [1]. The goal of a DPT decomposer is to decompose the...
Yue Xu, Chris Chu
ASPLOS
2011
ACM
12 years 9 months ago
DoublePlay: parallelizing sequential logging and replay
Deterministic replay systems record and reproduce the execution of a hardware or software system. In contrast to replaying execution on uniprocessors, deterministic replay on mult...
Kaushik Veeraraghavan, Dongyoon Lee, Benjamin West...
DAC
2009
ACM
14 years 6 months ago
Double patterning lithography friendly detailed routing with redundant via consideration
In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
Kun Yuan, Katrina Lu, David Z. Pan
ASPDAC
2010
ACM
637views Hardware» more  ASPDAC 2010»
13 years 3 months ago
A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography
As Double Patterning Lithography(DPL) becomes the leading candidate for sub-30nm lithography process, we need a fast and lithography friendly decomposition framework. In this pape...
Jae-Seok Yang, Katrina Lu, Minsik Cho, Kun Yuan, D...