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ASPDAC   2010 Asia and South Pacific Design Automation Conference
Wall of Fame | Most Viewed ASPDAC-2010 Paper
ASPDAC
2010
ACM
637views Hardware» more  ASPDAC 2010»
9 years 9 months ago
A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography
As Double Patterning Lithography(DPL) becomes the leading candidate for sub-30nm lithography process, we need a fast and lithography friendly decomposition framework. In this pape...
Jae-Seok Yang, Katrina Lu, Minsik Cho, Kun Yuan, D...
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