6 search results - page 1 / 2 » Reliability- and process variation-aware placement for FPGAs |
FPL
2006
Springer
13 years 8 months ago
2006
Springer
Both custom IC and FPGA designs in the nanometer regime suffer from process variations. But different from custom ICs, FPGAs' programmability offers a unique design freedom t...
DAC
2006
ACM
14 years 5 months ago
2006
ACM
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
DATE
2010
IEEE
13 years 9 months ago
2010
IEEE
Abstract—Negative bias temperature instability (NBTI) significantly affects nanoscale integrated circuit performance and reliability. The degradation in threshold voltage (Vth) d...
FPGA
2007
ACM
13 years 11 months ago
2007
ACM
Chip design in the nanometer regime is becoming increasingly difficult due to process variations. ASIC designers have adopted statistical optimization techniques to mitigate the e...
JCP
2008
13 years 4 months ago
2008
Rapid increase in transistor density and operating frequency has led to the increase in power densities, exhibiting itself as a high temperature profile. The high temperature spots...