In Deep Sub-Micron (DSM) designs, performance will depend critically on the latency of long wires. We propose a new synthesis methodology for synchronous systems that makes the de...
Luca P. Carloni, Kenneth L. McMillan, Alexander Sa...
Abstract— As technology scales to 0.13 micron and below, designs are requiring buffers to be inserted on interconnects of even moderate length for both critical paths and fixing...
Zhuo Li, Cliff C. N. Sze, Charles J. Alpert, Jiang...
As VLSI technology enters the nanoscale regime, interconnect delay has become the bottleneck of the circuit timing. As one of the most powerful techniques for interconnect optimiz...
In very deep-submicron VLSI, certain manufacturing steps – notably optical exposure, resist development and etch, chemical vapor deposition and chemical-mechanical polishing (CM...
Andrew B. Kahng, Gabriel Robins, Anish Singh, Huij...
Abstract— Deep submicron technology scaling has two major ramifications on the design process. First, reduced feature size significantly increases wire delay, thus resulting in...