7 search results - page 1 / 2 » Temperature and Process Variations Aware Power Gating of Fun... |
VLSID
2008
IEEE
14 years 5 months ago
2008
IEEE
Technology scaling has resulted in an exponential increase in the leakage power as well as the variations in leakage power of fabricated chips. Functional units (FUs), like Intege...
VLSID
2008
IEEE
14 years 5 months ago
2008
IEEE
Continuous technology scaling has resulted in an increase in both, the power density as well as the variation in device dimensions (process variations) of the manufactured process...
TVLSI
2008
13 years 4 months ago
2008
Abstract--Technology scaling in the nanometer era has increased the transistor's susceptibility to process variations. The effects of such variations are having a huge impact ...
INTEGRATION
2008
13 years 4 months ago
2008
Thermal gradients across the die are becoming increasingly prominent as we scale further down into the sub-nanometer regime. While temperature was never a primary concern, its non...
DATE
2008
IEEE
13 years 11 months ago
2008
IEEE
— The worst-case delay/power of function units has been used in traditional high level synthesis to facilitate design space exploration. As technology scales to nanometer regime,...