Current lithography techniques use a light wavelength of 193nm to print sub-65nm features. This introduces process variations which cause mismatches between desired and actual waf...
In this paper, we present simulation techniques to estimate the worst-case voltage variation using a RC model for the power distribution network. Pattern independent maximum envel...
To reduce manufacturing variation due to chemicalmechanical polishing and to improve yield, layout must be made uniform with respect to density criteria. This is achieved by layou...
Andrew B. Kahng, Gabriel Robins, Anish Singh, Alex...
Important layout properties of electronic designs include interconnection length values, clock speed, area requirements, and power dissipation. A reliable estimation of those prop...
In high-performance VLSI circuits, the on-chip power densities are playing dominant role due to increased scaling of technology, increasing number of components, frequency and ban...