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» Yield Estimation of VLSI Circuits with Downscaled Layouts
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GLVLSI
2009
IEEE
128views VLSI» more  GLVLSI 2009»
13 years 9 months ago
Impact of lithography-friendly circuit layout
Current lithography techniques use a light wavelength of 193nm to print sub-65nm features. This introduces process variations which cause mismatches between desired and actual waf...
Pratik J. Shah, Jiang Hu
ICCAD
2000
IEEE
73views Hardware» more  ICCAD 2000»
13 years 9 months ago
Simulation and Optimization of the Power Distribution Network in VLSI Circuits
In this paper, we present simulation techniques to estimate the worst-case voltage variation using a RC model for the power distribution network. Pattern independent maximum envel...
Geng Bai, Sudhakar Bobba, Ibrahim N. Hajj
VLSID
1999
IEEE
88views VLSI» more  VLSID 1999»
13 years 9 months ago
New and Exact Filling Algorithms for Layout Density Control
To reduce manufacturing variation due to chemicalmechanical polishing and to improve yield, layout must be made uniform with respect to density criteria. This is achieved by layou...
Andrew B. Kahng, Gabriel Robins, Anish Singh, Alex...
GLVLSI
1998
IEEE
169views VLSI» more  GLVLSI 1998»
13 years 9 months ago
On the Characterization of Multi-Point Nets in Electronic Designs
Important layout properties of electronic designs include interconnection length values, clock speed, area requirements, and power dissipation. A reliable estimation of those prop...
Dirk Stroobandt, Fadi J. Kurdahi
ISVLSI
2008
IEEE
104views VLSI» more  ISVLSI 2008»
13 years 11 months ago
Thermal-Aware Placement of Standard Cells and Gate Arrays: Studies and Observations
In high-performance VLSI circuits, the on-chip power densities are playing dominant role due to increased scaling of technology, increasing number of components, frequency and ban...
Prasun Ghosal, Tuhina Samanta, Hafizur Rahaman, Pa...